Substrate

Substrate is building a next-generation foundry to return America to dominance in semiconductor production. To achieve this, we will use our technology—a new form of advanced X-ray lithography—to power them. America invented semiconductors. We will lead again.

In September 2023, the @substrate team prepared an analysis on China's (still) not-yet-known rapid progress in advanced precision optics for EUV. This important work by China might otherwise be missed. We redacted portions we deemed best to protect. substrate.com/optics_documen…

Yesterday, @Reuters reported that China had completed a domestically built EUV tool. In the piece, they stated that "China still faces major technical challenges, particularly in replicating the precision optical systems that Western suppliers produce." reuters.com/world/china/ho…

10-30-2025 ($) An Interview with Substrate CEO James Proud About Building a Disruptive Foundry in America stratechery.com/2025/an-interv…

How to Kill 2 Monopolies with 1 Tool Substrate X-Ray Lithography, a New American Foundry, $10k Logic Wafers newsletter.semianalysis.com/p/how-to-kill-…

History repeatedly shows that American science and engineering solve impossible tasks. I started Substrate because I believed that this impossible task is one worth trying.

The United States invented all of the critical technologies that power today’s advanced semiconductors, but over time, we have lost the lead. For years, many have spoken of the need for a new pure-play American foundry, yet view it as an impossible task. History repeatedly shows that American science and engineering solve impossible tasks. As we rush to build more current-generation semiconductor fabs in America today, we need to start immediate work on building the semiconductor fabs of tomorrow. The stakes are too high for the United States not to try everything we can to solve both one of our most significant technological gaps and our biggest opportunities to reclaim leadership over the technologies we pioneered. substrate.com/our-purpose

These patterns have been printed using a Substrate lithography system with no IP or supply chain input from other advanced lithography tools. The resolution of the features in these images is equivalent to that achievable only with what the semiconductor industry refers to as “High NA EUV lithography” and matches features printed at the 2 nm semiconductor node and below. All of these images were printed in a single exposure, with no multi-patterning.

Substrate is building a next-generation foundry to return America to dominance in semiconductor production. To achieve this, we will use our technology—a new form of advanced X-ray lithography—to power them. America invented semiconductors. We will lead again.