EULITHA AG

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EULITHA AG

EULITHA AG

@Eulitha_AG

Eulitha provides lithography equipment, patterning services for photonics, electronics, optoelectronics, displays, biotechnology and other areas.

Switzerland Katılım Haziran 2016
36 Takip Edilen70 Takipçiler
EULITHA AG
EULITHA AG@Eulitha_AG·
We are proud that our technology helps saving people's lives by enabling novel plasmonically active microscope slides. See the Nature article by Balaur, E. et al.: Colorimetric histology using plasmonically active microscope slides disq.us/t/41qv7jr
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EULITHA AG
EULITHA AG@Eulitha_AG·
This week, for the first time we were able to ship two PHABLE™ lithography systems in one week. Great achievement for the team and sincere gratitude to our trusting customers!
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EULITHA AG
EULITHA AG@Eulitha_AG·
Eulitha is proud to launch PhableX line of photolithography systems for volume production of photonic products. The systems enable low-cost, high-volume production of photonic devices such as waveguides for Augmented Reality (AR). eulitha.com/fileadmin/imag…
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EULITHA AG retweetledi
ManuGaN
ManuGaN@ManuGaN_UK·
Our article "Displacement Talbot lithography for nano-engineering of III-nitride materials" is on the front page of Nature Microsystems & Nanoengineering: nature.com/micronano/
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EULITHA AG
EULITHA AG@Eulitha_AG·
Attending the MNE conference this week in Rhodes, Greece. As always this conference presents a good opportunity to catchup with colleagues and customers and meet new ones from Europe and beyond.
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EULITHA AG
EULITHA AG@Eulitha_AG·
We are at the CIOE Exhibition in Shenzhen this week. It is even greater than last year’s. Very lively show!
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EULITHA AG
EULITHA AG@Eulitha_AG·
Eulitha will be sharing their cutting-edge photolithography tools for printing nanoscale periodic structures at the next @CIOE_Shenzhen Exhibition. Join us at booth 2509 and ask us about our latest PhableR 200 DUV tool for 8” full field exposures.
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EULITHA AG
EULITHA AG@Eulitha_AG·
Researchers at @psich_de have printed their first wafer scale patterns on 8 inch wafers using the PhableR 200C tool. This represents an important milestone in the Phable series offering. Their results will be presented at the next MNE conference 2019: mne2019.org/assets/MNE_Sho…
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EULITHA AG
EULITHA AG@Eulitha_AG·
At this year’s International Conference on Nitride Semiconductors, being held in Washington, USA between July 7-12, a number of works are going to be presented that utilized Displacement Talbot Lithography technology of Eulitha. @Materials_MRS eulitha.com/company/news/a…
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EULITHA AG
EULITHA AG@Eulitha_AG·
@FBH_News The Fredinand-Braun-Institut of Berlin is going to present their pioneering work at the ICNS conference on Nitride Semiconductors on the use of our PHABLE lithograhy technology in the production of higher efficiency UVB and UVC LEDs. mrs.org/icns-13
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EULITHA AG
EULITHA AG@Eulitha_AG·
Eulitha is co-organizing this year’s Standford Advanced Lithography Symposium. snf.stanford.edu/about/AdvLitho… We are looking forward to showcasing the latest advancements in our PhableR series photolithography systems.
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EULITHA AG
EULITHA AG@Eulitha_AG·
The Eulitha team is at the CLEO conference in San Jose this week. Stop by our booth to hear about our latest solutions! #lithography #eulitha
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EULITHA AG
EULITHA AG@Eulitha_AG·
Eulitha will be sharing their cutting-edge tools for printing nanoscale periodic structures. Join us at the CLEO Laser Science to Photonic Applications Exhibition in San Jose, California USA. #Eulitha #CLEO #photonics
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EULITHA AG
EULITHA AG@Eulitha_AG·
We are excited to introduce our new Business Development Manager Dr. Duane Hudgins! He is already jumping in to help us deliver our world class products to our customers. Welcome to the team Duane!
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EULITHA AG
EULITHA AG@Eulitha_AG·
We had a great time at our annual New Year's dinner after a successful 2018. Thanks to all who made it happen, not the least to Viktoria for the wonderful cake!
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EULITHA AG
EULITHA AG@Eulitha_AG·
New article from Twente using PhableR 100 system to make nanopores in a SiO2 film by sinking Pt nanoparticles Engulfment control of platinum nanoparticles into oxidized silicon substrates for fabrication of dense solid-state nanopore arrays doi.org/10.1088/1361-6… via @IOPscience
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