JVST A - JVST B

One of the toughest obstacles in GaN etching is preventing surface roughness and damage. Authors from @CEA_Leti propose a mechanism for CH₄/H₂/Ar ICP etching of GaN, focusing on achieving smooth, damage-free surfaces for microstructure fabrication. doi.org/10.1116/6.0005…

Is the science prioritizing clean, compelling stories over real, messy, & honest data? 📈 Dive into the “reproducibility crisis” & explore where scientists may be going wrong & how to get back on track in this recent perspective from authors at @BYU. doi.org/10.1116/6.0005…

Authors from @UTwente show that, as a model system, calcium niobate nanosheets allow for more controlled exploration of subsurface effects during LEIS characterization, helping to refine data interpretation and strengthen confidence in surface analysis. doi.org/10.1116/6.0005…

Precise control of plasma etching depth is needed to ensure performance & reliability of semicon devices, but it isn’t simply “set & forget." Deeper integration of diagnostics, modeling, & process control is needed to achieve true nanoscale precision. doi.org/10.1116/6.0005…

It's your lucky day!🍀🌈 Check out this St. Paddy's Day publication reviewing 2D vanadium-based materials for energy storage, electronics, and smart devices. This is the latest article in the #JVSTA collection on #2Dmaterials. doi.org/10.1116/6.0005…

Traditional melt‑fraction measurement is slow, manual, and equipment‑heavy. This work from @TAMU shows a path toward automating a notoriously tedious task. doi.org/10.1116/6.0005…

Researchers from @NIST & @UofMaryland created microfabricated nanocalorimeters capable of high-temporal-resolution, high-sensitivity measurements of plasma energy fluxes. doi.org/10.1116/6.0005…

What makes high-entropy alloys so promising for next-gen coatings? From alloy design strategies to microstructure evolution & real-world performance, this review covers the latest insights shaping this rapidly advancing area of surface engineering. doi.org/10.1116/6.0005…

More power, less energy, tighter margins. Can current fabrication strategies keep pace with our technology appetite? From @Stanford, this work highlights how small adjustments in these processes can have outsized effects on performance at the nanoscale. doi.org/10.1116/6.0005…

The scalable synthesis of size-tunable Ni nanoparticles on carbon black w/ fluidized-bed #ALDep method advances non-noble metal Ni/C catalysts toward device-relevant H electrocatalysis & bridges ALD model systems w/ realistic catalyst architectures. doi.org/10.1116/6.0005…

Area-selective #ALDep is enhanced using a physical approach: ion sputter-etching. Well-controlled ions suppress unwanted nucleation & strongly improve selectivity without chemical etchants. doi.org/10.1116/6.0005…

From @IbsenPhotonics & DTU, a novel dry etching method for SiO₂ is presented, where anisotropic etching is achieved with a helium plasma in presence of a fluorocarbon-based solid source, leading to potential green solutions.🍃 doi.org/10.1116/6.0005…

Online and In-Person AVS Short Courses are Now Available - Monthly Additions to Come Throughout the Year! Controlling Contamination in Vacuum Systems - Fundamentals of Vacuum Technology - Sputter Deposition - UHV Design and Practices #AVSShortCourses conta.cc/4cKU35X

XPS/NMR show Ar⁺ sputtering cleans BmImPF6 surface without bulk change. Findings highlight how liquid fluidity drives unique impurity segregation, advancing surface analysis of ionic liquids. doi.org/10.1116/6.0005…

Computational investigations of area-selective #ALDep require realistic & suitable chemical models - authors from @UniLeipzig show the impact of this choice for AS-ALD modelling using SMIs on silica. doi.org/10.1116/6.0004…

A streamlined oxide MBE approach enables epitaxial SrTiO₃/GaAs with abrupt interfaces, advancing practical integration of functional oxides with III–V technologies. @LiorKornblum doi.org/10.1116/6.0005…

XPS results can differ significantly depending on whether a sample is electrically grounded or electrically isolated. This distinction highlights the importance of considering the sample's work function to obtain correct interpretations. doi.org/10.1116/6.0005…

Authors from @ionoptikaltd and @cambridge_uni team up to expand the use of SIMS in materials analysis by exploring the use of a variety of giant gas cluster ion beams in sputtering & depth profiling of complex inorganic/organic materials. doi.org/10.1116/6.0005…

Authors from @OVGUpresse use the pyroelectric effect to create a compact, energy-efficient X-ray source & show a performance boost by moving from single to double-crystal config. This opens the door to portable, low-power systems for materials analysis. doi.org/10.1116/6.0005…

In #JVSTB, researchers present a tabletop EUV test platform designed for lab-scale evaluation of lithography materials to reduce reliance on large, costly facilities while still enabling reliable measurements doi.org/10.1116/6.0004…