Fractilia

In a new article from @ElectronicsNews, Fractilia's Chris Mack explains why "closing the stochastics gap" relies not just on lithography improvement, but on the semiconductor industry doing a complete overhaul of their definition of control. Read more at electronicsweekly.com/news/closing-t….

#Stochastic variability at advanced nodes demands precise measurement. Our whitepaper examines enhanced #metrology approaches to help teams better characterize stochastic effects—the critical first step toward solutions. 📄 Download at fractilia.com.

In high-volume DRAM manufacturing, catching a yield-impacting event early can make all the difference. In our latest from #SPIELitho 2026 — can stochastics measurements from CD-SEM images outperform traditional CD and defect metrics for yield prediction? fractilia.com/public-academy/

Fractilia's FAME 300™ is now deployed in production at a top-5 semiconductor manufacturer — fully automated, fully integrated, and running across 200+ metrology steps. The stochastics era of manufacturing is here. Read more: fractilia.com/news

Next week at #SPIEALP (Feb 22–26): - Chris Mack on the 50th anniversary panel (Feb 23) - Robert L. Bristol presenting on probabilistic process windows & EPE analysis (Feb 25) - Plus Fractilia co-authors on @intel & @IBMResearch papers Stop by and say hello! #LithoGuru

We'll be at #SPIE Advanced Lithography + Patterning in San Jose (Feb 22–26). Catch #Fractilia's Robert Bristol in 2 sessions on Feb 25, and Chris Mack on the All-Symposium Panel on Feb 23. Connect with us if you're there! #ClosingTheStochasticsResolutionGap #LithoGuru

We'll be at @SEMIconex Korea next week! 👋 Visit us in the Woowon Technology Co. booth from Feb 11-13 in Seoul. Learn how Fractilia's #stochastics #metrology and control solutions are helping leading #fabs improve device yield and performance at advanced nodes. #SEMICONKorea

Join Chris Mack at #SPIEPhotomaskEUV 2025 as he explores tradeoffs to tackling stochastic variations in EUV lithography-including changing scanner dose, resist improvements, stochastics-aware OPC and process control. #lithoguru Full event details: spie.org/photomask-tech…

Looking forward to seeing you tomorrow at @SEMIconex Taiwan, as #Fractilia's Chris Mack explores stochastics problems from the Resolution perspective. #SEMICONTaiwan #ClosingTheStochasticsResolutionGap #LithoGuru

#Fractilia releases Version 5.0 of our product suite, featuring Gen 5 of our patented FILM™ technology—delivering the highest measurement accuracy in #stochastics #metrology to tackle unprecedented variability challenges at advanced nodes. Learn more at fractilia.com/news.

The 4-6nm gap between lab & production capabilities doesn't sound like much, but it adds up to lost revenue. FAST. Read more from our CTO Chris Mack in @eetimes: eetimes.com/stochastics-yi…. #ClosingTheStochasticsResolutionGap

CTO Dr. Chris Mack will present at @SEMIconex Taiwan's IC Forum - Advanced Chip Technology & Manufacturing on 9/9 @ 3:30pm. 🗣️ "Closing the Stochastics Resolution Gap" Join the presentation & visit booth #MO134 to connect. Full details & registration at semicontaiwan.org/en/node/15036.

Why are the critical feature sizes achieved in the lab so hard to manufacture in volume in the fab? The stochastics resolution gap. Download our newly released whitepaper at tinyurl.com/fractilia. #ClosingTheStochasticsResolutionGap

A stochastic resolution gap is limiting critical feature sizes in advanced manufacturing. Accurate data is the first step in closing the gap. Download our new whitepaper at fractilia.com for more information. #ClosingTheStochasticsResolutionGap

Light is made of photons. Photoresist is made of molecules. Their random behavior is costing the #semiconductor industry billions in unrealized revenue. Learn more in our new whitepaper at tinyurl.com/fractilia. #ClosingTheStochasticsResolutionGap

We’re pleased to announce our new FAME OPC product, which brings our #stochastics metrology to optical proximity correction development and production systems for improved #EUV #patterning control and yields. Learn more @Fractilia bit.ly/4aXgBvV

The article “Keeping #MooresLaw on Track” from our friends and colleagues at @ASMLcompany highlights their latest efforts to bring #HighNA #EUV #lithography into production @IEEESpectrum bit.ly/44OqdXt #semiconductors

Part of U.S. #CHIPSAct funding is to address #metrology gaps in the #semiconductor ecosystem. @Fractilia CTO @ChrisMack describes the metrology capabilities needed for future chips in this @SemiEngineering article bit.ly/44KkJwA #NIST #eBeam #technology #manufacturing

Fractilia has been named one of the ‘#Longhorn100’, representing the 100 fastest growing businesses in 2023 from @UTAustin #alumni. Check out the list bit.ly/3NB9l05 #innovation #technology #semiconductors #stochastics #metrology

New development for #EUV #stochastics control - #Fractilia #Overlay Package adds overlay #metrology to our solutions to further improve #EUV #patterning control and #yields bit.ly/3qDhqbI #lithography